Random Deposition Model with a Constant Capture Length
نویسندگان
چکیده
منابع مشابه
Random Deposition Model with a Constant Capture Length
We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance l, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical propertie...
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ژورنال
عنوان ژورنال: Progress of Theoretical Physics
سال: 2005
ISSN: 0033-068X,1347-4081
DOI: 10.1143/ptp.113.15